The preparation chamber is equipped with fabrication and analysis tools. A 3 sources e-beam evaporator is used for evaporation of a wide range of materials. A sputter ion gun is designed for backsputtering of substrates, samples or tips. A compact electron beam gun is used for STM tip cleaning in UHV. A heating stage is used to anneal substrates or samples. The LEED-AES system provides complementary surface analysis of samples.